Canon FPA-6000ES5: updated 248nm litho stepper for 100nm processes
At Semicon West (July 14-16, San Francisco) Canon is to introduce the first sample of new photo-lithographic stepper, FPA-6000ES6, designed to replace FPA-6000ES5 and providing improved resolution and performance.
Despite even the price is already known (¥1.6 billion or $13.5 million), the company receives orders for FPA-6000ES6 for only Q2 2004, not sounding reasons of 9-month delay.
According to Canon, FPA-6000ES6 enables production of 100nm chips at about 147 silicon wafers (300mm) or 170 wafers (200mm) per hour. FPA-6000ES5, announced a year ago, is designed for 110nm process and provides 5% less performance: up to 140 wafers (300mm) per hour. Itís interesting that FPA-6000ES6 features the same 248nm Krypton Flouride (KrF) excimer laser, but provides higher resolutions due to the improved 4:1 optics and 0.86 aperture. Canon plans to ship up to 50 of such plants in 2004.
Source: Silicon Strategies
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