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Intel And Micron Sample First 50-Nanometer NAND Flash Memory Devices

Micron Technology, Inc., and Intel Corporation today announced they are sampling the industry's first NAND flash memory built on 50-nanometer process technology. The samples were manufactured through IM Flash Technologies, a joint development and manufacturing venture from Micron and Intel. Both companies are sampling 4 gigabit devices now, with plans to mass produce a range of densities on the 50nm node in 2007.

This move to 50nm process technology will enable Intel and Micron to meet the growing demand for higher density NAND flash across a range of computing and consumer electronics applications such as digital music players, removable storage and handheld communications devices. According to industry research forecasts, the NAND market segment is estimated to reach $13 to $16 billion in 2006 and grow to approximately $25 to $30 billion by 2010.

Micron and Intel formed IM Flash Technologies (IMFT) in January to manufacture NAND flash memory products for the two companies. IMFT has been aggressively ramping its manufacturing facilities since the company's formation. Micron is currently supplying the venture NAND flash from its Boise fabrication facilities, and Micron's 300 mm facility in Manassas, Va., will be online later this year to supply IMFT with NAND. Meanwhile, the Lehi, Utah facility that is dedicated to IMFT and serves as its headquarters is expected to be online producing NAND early next year.

Source: Intel Corporation

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