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Cymer Launches New ArF Lithography Light Source, XLA 400

Cymer launched its XLA 400 at Cymer's 13th Annual Lithography Symposium in Chiba, Japan. This fifth generation MOPA-based light source offers chipmakers the highest repetition rate at 6 kHz and 90 W of output power - making it the industry's highest-powered light source available, to drive the volume production of semiconductor devices at the 65nm node and enable design flexibility for hyper NA (greater than 1.0) immersion lithography tools at the 45nm node and beyond. Further, the XLA 400 offers increased power to support various illumination schemes, permitting tighter dose stability and more stringent critical dimension (CD) control.

By delivering the highest power output available, the XLA 400 will allow chipmakers to push ArF lithography down to the 45nm node, without having to suffer throughput loss and reduced productivity associated with advanced reticle enhancement techniques (RETs) that will be required to support this node.

Deliveries of the XLA 400 will begin in the second quarter of 2006.

Source: Cymer

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