Intel To Build Second 45nm 300mm Wafer Fab
Intel today announced plans to build a new 300-millimeter wafer fab at its site in Kiryat Gat, Israel. The new factory, designated Fab 28, will be producing newest microprocessors in the second half of 2008 on 45 nanometer process technology. Construction on the $3.5 billion project, Intelís second 45nm factory, is set to begin immediately.
When completed, Fab 28 will become Intel's seventh 300mm wafer facility. The structure will include approximately 200,000 square feet of clean room space. Over the next several years the project will create more than 2,000 Intel jobs at the site. The Israeli government is providing financial incentives for the new facility.
Intel currently operates five 300mm fabs that provide the equivalent manufacturing capacity of about eight older generation 200mm factories. Those factories are located in Oregon, Arizona and New Mexico in addition to Ireland where an expansion of Intel's 300mm capacity in Ireland (Fab 24-2) is scheduled to begin operations in the first quarter of next year. In July Intel announced plans to invest more than $3 billion to build another 300mm fab, Fab 32 in Chandler, Ariz.
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