Cymer Ships First 6 kHz Light Source For 45nm Processes
Cymer, the supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, announced the first shipment of its XLA 300 - marking the fastest product development cycle in the company's history. The XLA 300 is the world's first 6 kHz, 193nm, argon fluoride (ArF) light source - designed to enable the volume production of 45nm immersion photolithography applications.
Said to deliver the highest repetition rate available on any light source to date, the 6kHz XLA 300 offers 60W of output power, allowing increased power to be delivered at lower pulse energies - minimizing optical material damage to both the illuminator and projection optics. Further, by operating at 6kHz, the XLA 300 delivers an increased number of pulses to support the strict dose and dose stability parameters required by chipmakers to achieve tight critical dimension (CD) control for 45nm node processes. The XLA 300 enables the exposure of ultra-fine critical features and offers flexibility to optimize the capabilities of catadioptric lens designs for high-volume production at the 45nm node.
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