ASML Twinscan AT:1200B: new 193-nm litho tool for 300-mm wafers and 90-nm chips
Today Dutch ASML Holding NV posted the press release, announcing details about new 193-nm TWINSCAN AT:1200B Step & Scan System for 90-nm chip volume production.
Twinscan AT:1200B provides resolutions up to 80-nm and is designed for 300-mm wafers. Like all other Twinscan tools, AT:1200B can process two wafers simultaneously.
Pity, there’s no information about the performance in the press release. AT:1200B shipments are scheduled to mid-2003.
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