Japanese companies to release EUV plants in 2005
According to provisional data announced at the sixth International Forum on Semiconductor Technology (IFST), Japanese Extreme Ultraviolet Lithography System Development Association (EUVA) plans to launch the development of the first EUV plant this year. A working prototype is expected in 2005.
Besides EUVA, there’s another organization in Japan Association of Super-Advanced Electronics Technologies (ASET) – that develops EUV plant as well. However it seems that EUVA created in 2001 will become a leader in this development.
It’s also interesting that EUVA includes Canon and Nikon that are real rivals. But they will jointly develop optical systems for the EUV plant sample. Nevertheless both rivals plan to advance their own EUV products to the market.
Source: Silicon Strategies
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