Nikon and Tokyo Electron join efforts for immersion litho development
In the context of its litho tools roadmap, Nikon signed the agreement with another Japanese company, Tokyo Electron (TEL), for immersion lithography joint development.
According to the document, companies plan to join efforts in the immersion litho development to prolong the life time of 193nm systems. Besides, the agreement implies Nikon and TEL joint cooperation with new-type photoresist suppliers.
The near-term plans include qualification of developed elements by 2003 and transition to the volume production as soon as the new technology is ready.
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